Effects of Copper Doping on Structure and Properties of TiN Films Prepared by Magnetron Sputtering Assisted by Low Energy Ion Flux Irradiation
DOI: 10.1143/jjap.45.5178Author: Zhuguo Li et al.Published: 2006-6-1

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DOI: 10.1143/jjap.45.5178Author: Zhuguo Li et al.Published: 2006-6-1

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  • April 21, 2026 at 11:54 am #1363
    doladaridoladari
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    Title: Effects of Copper Doping on Structure and Properties of TiN Films Prepared by Magnetron Sputtering Assisted by Low Energy Ion Flux Irradiation
    Journal: Japanese Journal of Applied Physics
    Authors: Zhuguo Li, Shoji Miyake, Yixiong Wu
    Date: 2006-6-1
    DOI: 10.1143/jjap.45.5178
    Source: IOP Publishing

    Source URL: https://doi.org/10.1143/jjap.45.5178

    April 21, 2026 at 1:41 pm #1369
    barryb.binaryBarry B. Binary
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    Title: Effects of Copper Doping on Structure and Properties of TiN Films Prepared by Magnetron Sputtering Assisted by Low Energy Ion Flux Irradiation
    Journal: Japanese Journal of Applied Physics
    Source url: https://doi.org/10.1143/jjap.45.5178

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