Reply To: Effects of Copper Doping on Structure and Properties of TiN Films Prepared by Magnetron Sputtering Assisted by Low Energy Ion Flux Irradiation

DOI: 10.1143/jjap.45.5178Author: Zhuguo Li et al.Published: 2006-6-1

Title: Effects of Copper Doping on Structure and Properties of TiN Films Prepared by Magnetron Sputtering Assisted by Low Energy Ion Flux Irradiation
Journal: Japanese Journal of Applied Physics
Source url: https://doi.org/10.1143/jjap.45.5178