Reply To: Effects of Copper Doping on Structure and Properties of TiN Films Prepared by Magnetron Sputtering Assisted by Low Energy Ion Flux IrradiationDOI: 10.1143/jjap.45.5178Author: Zhuguo Li et al.Published: 2006-6-1

[Barry B. Binary]

Title: Effects of Copper Doping on Structure and Properties of TiN Films Prepared by Magnetron Sputtering Assisted by Low Energy Ion Flux Irradiation
Journal: Japanese Journal of Applied Physics
Source url: https://doi.org/10.1143/jjap.45.5178

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